Heater
MPH
Metal Plate Heater
Large-area heater with heating elements and thermal sensors embedded in a precision-machined metal base for uniform heating of wafers and substrates.
Features
- Uniform temperature distribution and fast response
- High flatness and heat resistance in high-vacuum, high-temperature environments
- Conductive and insulated configurations
- Integrated cooling lines, temperature sensors and electrodes — tailored to your equipment
- 8-layer stack: metal base · graphite · mica · 1T mica heater · heat-resistant silicone
Applications
Semiconductor wafer heating equipment, display manufacturing equipment, vacuum chambers and plasma systems, laser and precision processing equipment, and other equipment requiring uniform heat distribution.
Specification
| Material | SUS304, Inconel, Aluminum, Oxygen Free Copper, etc. |
|---|---|
| Surface flatness | ≤ 5 ㎛ (based on Ø300 mm) |
| Operating temperature | -60℃ ~ +400℃ (varies by model) |
| Type | Conductive / Insulated / Cooling / Heating |
| Input | According to user request (controllable by heating zone) |
| Connector interface | Customizable (integrated power and sensors) |