Heater
MCH
Metal Chuck Heater
Key component that holds wafers or substrates in semiconductor, display and vacuum equipment. Surface flatness ≤5㎛, uniformity adjustable within ±3℃.
Features
- Built-in heating elements for rapid thermal response and uniform distribution
- Excellent structural integrity and insulation at high temperature
- High-temperature metals such as SUS, Inconel, Cu and Ti
- Conductive · Insulated · Cooling · Heating types
- Stable contact and heat transfer even in high vacuum
Applications
Holding and heating wafers and substrates in semiconductor, display and vacuum equipment.
Specification
| Material | SUS304, Inconel, Aluminum, Oxygen Free Copper, etc. |
|---|---|
| Surface flatness | ≤ 5 ㎛ (based on Ø300 mm) |
| Operating temperature | -60℃ ~ +400℃ (varies by model) |
| Type | Conductive / Insulated / Cooling / Heating |
| Input | According to user request (controllable by heating zone) |
| Connector interface | Customizable (integrated power and sensors) |
| Uniformity | Adjustable within ±3℃ (based on chamber environment) |